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UV Ozone 紫外光臭氧清洗機
Basic Plasma Cleaner
with 3 " diameter
These systems have proven highly effective for the removal of molecular organic contamination and surface preparation via intense ultraviolet light emitted at wavelengths of 185 nm and 254 nm. In the presence of ambient oxygen this emission results in significant O3 production and molecular excitation. This combination drives the destruction of molecular-level organic contamination on a number of substrates including silicon, silicon nitride, glass, quartz, metals and ceramics.
PSD-UV - Standard UV / Ozone Cleaning System
PSD-UVT - UV / Ozone Cleaning System with Temperature Control up to 150 degree
C
We can offer from 3",4",6",8",10",12" and special size 10*16" to 12*16"
For follow material:
Silicon ,Gallium Aresenide ,Glass ,Quartz ,Mica ,Sapphire
,Metals ,Ceramics ,Polymers
Resists
Application :
1. AFM Probe Cleaning / Tip Sharpening
2. Semiconductor Surface Oxidation and Preparation
3. Cleaning Lenses and Optics
4. Improvement of Surface Wettability
5. Cleaning Quartz and Ceramic Surfaces
6. Preparation for Thin Film Deposition
7. Ultraviolet Curing
8. Surface Patterning
9. Ozone Etching
U.S.A