翰揚公司-IR UV AA ICP GC LC EPA Standards

Features and Benefits :

Automatically profiles wafer sizes up to 300 mm and collects measurements using standard or user-defined profile patterns.

Operates in both reflection and transmissionmodes for maximum versatility and productivity in R&D labs or fabrication environments

Produces multiple point measurements (profiling), referenced to either flats or notches, and has a spectral range of 4800-400cm-1

Supports a full range of FT-IR applications including the analysis of bulk silicon impurities, epitaxial film thickness and dielectric film dopants in dual mode operation

Offers a Windows operating system and OMNIC application development and data analysis software, complete with a powerful quantitative analysis package optimized for semiconductor measurements of dielectric films, as well as a macro development package

The ECO 2000 wafer analysis system from Nicolet uses a Fourier Transform infrared (FT-IR) spectrometer and OMNICR ECO software designed specifically to enhance the spectroscopic analysis of semiconductor wafers. A dynamically aligned, frictionless bearing interferometer system optimized for the mid-infrared functions as the heart of the device. The system produces multiple point measurements (profiling), referenced to either flats or notches, in transmission and reflectance modes using the pre-programmed SEMI standard patterns or a user-defined special pattern .

Features and Benefits :

Switches between reflectance and transmission measurements by software command

Offers spectral range of 4800-400 cm-1 for both transmission and reflectance spectroscopy

Features a single integrated Standard Mechanical InterFace (SMIF) mini-environment

Uses TeflonR-coated vacuum holds for all wafer handling

矽晶材料碳氧含量分析

規格 :

Range : 0.4-40.0 ppm

Range : 0.4-10.0 ppm